Solution process of graphene-induced ohmic contact between the metal and AlGaN/GaN for hemts application

Author affiliations

Authors

  • Viet Cuong Tran VKTECH Research Center, NTT Hi-Tech Institute, Nguyen Tat Thanh University, 298-300A Nguyen Tat Thanh Street, Ward 13, District 4, Ho Chi Minh City, Viet Nam https://orcid.org/0000-0001-9225-6596
  • Anh Hao Huynh Vo Laboratory of Laser Technology, Faculty of Applied Science, Ho Chi Minh City University of Technology (HCMUT), 268 Ly Thuong Kiet Street, District 10, Ho Chi Minh City, 72409 Viet Nam
  • The Duy Nguyen VKTECH Research Center, NTT Hi-Tech Institute, Nguyen Tat Thanh University, 298-300A Nguyen Tat Thanh Street, Ward 13, District 4, Ho Chi Minh City, Viet Nam
  • Duc Anh Dinh VKTECH Research Center, NTT Hi-Tech Institute, Nguyen Tat Thanh University, 298-300A Nguyen Tat Thanh Street, Ward 13, District 4, Ho Chi Minh City, Viet Nam https://orcid.org/0000-0002-3762-5245
  • Trung Tin Tran Department, of Engineering Physics, Faculty of Applied Science, Ho Chi Minh City University of Technology (HCMUT), 268 Ly Thuong Kiet Street, District 10, Ho Chi Minh City, 72409 Viet Nam https://orcid.org/0000-0002-9550-6455
  • Trung Nghia Tran Laboratory of Laser Technology, Faculty of Applied Science, Ho Chi Minh City University of Technology (HCMUT), 268 Ly Thuong Kiet Street, District 10, Ho Chi Minh City, 72409 Viet Nam https://orcid.org/0000-0002-0351-8193

DOI:

https://doi.org/10.15625/2525-2518/19751

Keywords:

high electron mobility transistors (HEMTs), graphene, AlGaN/GaN, ohmic contact

Abstract

This work demonstrates an AlGaN/GaN high electron mobility transistor (HEMT) with Cr/Graphene ohmic contacts constructed without heat treatment. The Cr/Graphene ohmic contact was fabricated using a spray-coated graphene nanoflakes solution and electron-beam-evaporated Cr. This method does not require a high-temperature annealing step in conventional Ti/Al/Ni/Au ohmic contact. It is suggested that the Cr/graphene combination acts similarly to a doped n-type semiconductor in contact with AlGaN/GaN heterostructures, enabling carrier transport to the AlGaN layer. The investigated Au/Cr/ Graphene/AlGaN/GaN HEMT device exhibits ohmic drain characteristics in the range of -4 V to 4 V of drain-source voltage with a calculated contact resistance density of 2.5 mΩcm2. Our results have important implications for the fabrication and manufacturing of AlGaN/GaN-based microelectronic and optoelectronic devices/sensors of the future.

Downloads

Download data is not yet available.

References

Ma C. T., Gu Z. H. - Review of GaN HEMT Applications in Power Converters over 500 W, Electronics 8 (2019) 1401. DOI: https://doi.org/10.3390/electronics8121401

Yu C., Wang F., He J., Zhang Y., Sun R., Xu W., Ding G., Feng Q., Wang X., Wang Y., He M., Chen W., Jia H., Chen H. - High Voltage Normally-Off p-GaN Gate HEMT with the Compatible High Threshold and Drain Current, ECS Journal of Solid State Science and Technology 11 (2022) 085009. DOI: https://doi.org/10.1149/2162-8777/ac8a71

Remesh N., Chandrasekar H., Venugopalrao A., Raghavan S., Rangarajan M., Nath D. N. - Re-engineering transition layers in AlGaN/GaN HEMT on Si for high voltage applications, Journal of Applied Physics 130 (2021) DOI: https://doi.org/10.1063/5.0045952

Sahebghalam N., Shalchian M., Chalechale A., Jazaeri F. - High-Temperature HEMT Model, IEEE Transactions on Electron Devices 69 (2022) 4821-4827. DOI: https://doi.org/10.1109/TED.2022.3184662

Lu S., Burgos R., Lu G. Q. - Packaging and high-temperature characterization of a 650 V, 150 A eGaN HEMT, Semiconductor Science and Technology 36 (2021) 034006. DOI: https://doi.org/10.1088/1361-6641/abdf2a

Islam N., Mohamed M. F. P., Khan M. F. A. J., Falina S., Kawarada H., Syamsul M. - Reliability, Applications and Challenges of GaN HEMT Technology for Modern Power Devices: A Review, Crystals 12 (11) (2022)1581. DOI: https://doi.org/10.3390/cryst12111581

Haziq M., Falina S., Manaf A. A., Kawarada H., Syamsul M. - Challenges and Opportunities for High-Power and High-Frequency AlGaN/GaN High-Electron-Mobility Transistor (HEMT) Applications: A Review, Micromachines 13 (2022) 2133. DOI: https://doi.org/10.3390/mi13122133

Mounika B., Ajayan J., Bhattacharya S., Nirmal D. - Recent developments in materials, architectures and processing of AlGaN/GaN HEMTs for future RF and power electronic applications: A critical review, Micro and Nanostructures 168 (2022) 207317. DOI: https://doi.org/10.1016/j.micrna.2022.207317

Chen D., Wan L., Li J., Liu Z., Li G. - Ohmic contact to AlGaN/GaN HEMT with electrodes in contact with heterostructure interface, Solid-State Electronics 151 (2019) 60-64. DOI: https://doi.org/10.1016/j.sse.2018.10.012

Sung Park P., Reddy K. M., Nath D. N., Yang Z., Padture N. P., Rajan S. - Ohmic contact formation between metal and AlGaN/GaN heterostructure via graphene insertion, Applied Physics Letters 102 (2013) DOI: https://doi.org/10.1063/1.4801940

Chem T., Moosa A., Abed M. - Graphene preparation and graphite exfoliation, Turkish Journal of Chemistry 45 (2021) 493-519. DOI: https://doi.org/10.3906/kim-2101-19

Reichardt S., Wirtz L. - Raman Spectroscopy of Graphene, arXiv: Mesoscale and Nanoscale Physics (2017) DOI: https://doi.org/10.1142/9789813148758_0003

Insta NANO, Graphene Number of Layers Calculator From ID/IG and I2D/IG Ratio via Raman Spectroscopy, https://instanano.com/all/characterization/raman/graphene-layers/ (accessed 1st September 2023).

Sarac B., Stephens D., Eisener J., Rosselló J., Mettin R. - Cavitation bubble dynamics and sono chemiluminescence activity inside sonicated submerged flow tubes, 2020. DOI: https://doi.org/10.1016/j.cep.2020.107872

Arao Y., Mori F., Kubouchi M. - Efficient solvent systems for improving production of few-layer graphene in liquid phase exfoliation, Carbon 118 (2017) DOI: https://doi.org/10.1016/j.carbon.2017.03.002

Pandit B., Seo T., Ryu B., Cho J. - Current transport mechanism in graphene/AlGaN/GaN heterostructures with various Al mole fractions, AIP Advances 6 (2016) 065007. DOI: https://doi.org/10.1063/1.4953917

Downloads

Published

31-07-2024

How to Cite

[1]
V. C. Tran, A. H. Huynh Vo, T. D. Nguyen, D. A. Dinh, T. T. Tran, and T. N. Tran, “Solution process of graphene-induced ohmic contact between the metal and AlGaN/GaN for hemts application”, Vietnam J. Sci. Technol., vol. 61, no. 4, Jul. 2024.

Issue

Section

Materials