DESIGN AND SIMULATION ANALYSIS OF AN ELECTROSTATIC ACTUATOR FOR IMPROVING THE PERFORMANCE OF SCANNING PROBE NANOLITHOGRAPHY

Authors

  • Le Van Tam Hanoi University of Science and Technology
  • Dang Van Hieu Hanoi University of Science and Technology
  • Nguyen Duy Vy Ton Duc Thang University
  • Vu Ngoc Hung Hanoi University of Science and Technology
  • Chu Manh Hoang Hanoi University of Science and Technology

DOI:

https://doi.org/10.15625/2525-2518/55/4/8803

Keywords:

Electrostatic actuator, symmetrical operation mode, scanning probe lithography

Abstract

In this paper, we design and simulate a micro-suspension based scanning probe for nanolithography using electrostatic actuation. The probe consists of a square plate with a pyramid tip at the center that is suspended by four beams. The entire probe is made of single silicon and is operated in air medium. Operation characteristics are analyzed by finite element method. The operation mode is symmetrical that overcomes the lateral displacement in the unsymmetrical operation mode of conventional scanning probe nanolithography, hence increasing the precision in lithographed nanostructures. The effect of electric field fringe and fixed electrode to the operation of the scanning probe are also analyzed in detail.

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Author Biographies

Le Van Tam, Hanoi University of Science and Technology

Master student

Dang Van Hieu, Hanoi University of Science and Technology

PhD student

Nguyen Duy Vy, Ton Duc Thang University

PhD

Vu Ngoc Hung, Hanoi University of Science and Technology

Assoc. Prof.

Chu Manh Hoang, Hanoi University of Science and Technology

PhD., Lecturer

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Published

2017-08-21

Issue

Section

Materials