SUPPORTED LIQUID MEMBRANE WITH STRIP DISPERSION FOR RECOVERING INDIUM FROM ETCHING SOLUTION OF LCD INDUSTRY: INFLUENCE OF FACTORS ON PERFORMANCE
Keywords:liquid membrane, indium recovery, etching solution, D2EHPA, some important factors
Supported liquid membrane with strip dispersion (SLMSD) is a promising process for metal recovery from e-waste or waste streams because of many advantages such as the ability to combine extraction and stripping into one single step and thus have non-equilibrium mass transfer characteristics and maximum driving force. This paper investigated the effect of important factors on SLMSD performance to recover indium from etching solution such as: pH of feed solution, extractant (Di-(2-ethylhexyl) phosphoric acid (D2EHPA)) concentration, oxalic acid concentration. It was found that 99.5 % In3+ was removed from feed solution in about 20 minutes with high concentration factor (4.5) under suitable conditions (pH 1; 0.6M Di-(2-ethylhexyl) phosphoric acid (D2EHPA), 2 wt% oxalic acid).
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