On the contribution factors of enhanced photocatalytic activity of doped semiconductors: Structural and optical investigation of Cu2+ doped ZnO nanoparticles
Author affiliations
DOI:
https://doi.org/10.15625/2525-2518/59/3/15490Keywords:
Doped ZnO nanoparticle, photocatalysis, bandgap, recombination rate, visible absorptionAbstract
As a traditional direct bandgap oxide semiconductor, ZnO, showed as a promising photocatalytic candidate. Researchers worldwide reported many possibilities to improve its photocatalytic activity such as doped with metal, non-metal ions. As a result of heterojunction formation between ZnO and its intentional impurity, previous reports showed beneficial characteristics for enhancing photocatalytic activity in these ZnO-based materials, i.e. bandgap narrowing, recombination rate of photoelectron-hole prolonging, visible light absorption improving. This work will present the photocatalytic acitivity improvement of ZnO when doping with ion Cu2+ and try to illustrate the crucial photocatalytic enhancement factors.Downloads
References
Khaki M R D, Shafeeyan M S, Raman A A A and Daud W Journal of environmental management 198 (2017) 78-94 10.1016/j.jenvman.2017.04.099
Bora T, Sathe P, Laxman K, Dobretsov S and Dutta J Catalysis Today 284 (2017) 11-8 10.1016/j.cattod.2016.09.014
Kumar S G and Rao K S R K RSC Advances 5 (2015) 3306-51 10.1039/C4RA13299H
Hou T-F, Shanmugasundaram A, Hassan M A, Johar M A, Ryu S-W and Lee D-W International Journal of Hydrogen Energy 44 (2019) 19177-92 10.1016/j.ijhydene.2018.05.105
Ko Y C, Fang H Y and Chen D H Journal of Alloys and Compounds 695 (2017) 1145-53 10.1016/j.jallcom.2016.10.241
Van Tuan P, Phuong T T, Tan V T, Nguyen S X and Khiem T N Materials Science in Semiconductor Processing 115 (2020) 105114 10.1016/j.mssp.2020.105114
Raizada P, Sudhaik A and Singh P Materials Science for Energy Technologies 2 (2019) 509-25 10.1016/j.mset.2019.04.007
Choi S, Do J Y, Lee J H, Ra C S, Kim S K and Kang M Materials Chemistry and Physics 205 (2018) 206-9 10.1016/j.matchemphys.2017.11.022
Achouri F, Corbel S, Balan L, Mozet K, Girot E, Medjahdi G, Said M B, Ghrabi A and Schneider R Materials & Design 101 (2016) 309-16 https://doi.org/10.1016/j.matdes.2016.04.015
Janisch R, Gopal P and Spaldin N A Journal of Physics: Condensed Matter 17 (2005) R657-R89 10.1088/0953-8984/17/27/r01
Nguyen S X, Nguyen Q M, Trinh T X, Joita A C and Nistor S V Semiconductor Science and Technology (2020) 10.1088/1361-6641/aba168
Xuan Sang N, Minh Quan N, Huu Tho N, Tri Tuan N and Thanh Tung T Semiconductor Science and Technology 34 (2019) 025013 10.1088/1361-6641/aaf820
Luo X, Lee W-T, Xing G, Bao N, Yonis A, Chu D, Lee J, Ding J, Li S and Yi J Nanoscale Research Letters 9:625 (2014)
Iqbal A, Mahmood A, Muhammad Khan T and Ahmed E Progress in Natural Science: Materials International 23 (2013) 64-9 10.1016/j.pnsc.2013.01.010
Nguyen C T, Pham T P, Luu T L A, Nguyen X S, Nguyen T T, Nguyen H L and Nguyen D C Ceramics International 46 (2020) 8711-8 10.1016/j.ceramint.2019.12.108
Nath D, Singh F and Das R Materials Chemistry and Physics 239 (2020) 122021 10.1016/j.matchemphys.2019.122021
Safa S, Azimirad R, Safalou Moghaddam S and Rabbani M Desalination and Water Treatment 57 (2015) 6723-31 10.1080/19443994.2015.1012561
Sang N X, Huong P T L, Thy T T M, Dat P T, Minh V C and Tho N H Superlattices and Microstructures 121 (2018) 9-15 10.1016/j.spmi.2018.07.020
Sang N X and Minh V C Nanotechnology 31 (2020) 435703 10.1088/1361-6528/aba65c
Qamar M A, Shahid S, Javed M, Iqbal S, Sher M and Akbar M B Journal of Photochemistry and Photobiology A: Chemistry 401 (2020) 112776 10.1016/j.jphotochem.2020.112776
Manzoor M F, Ahmed E, Ahmad M, Ahmad I, Rana A M, Ali A, Ghouri M I, Manzoor M S and Aziz M T Materials Science in Semiconductor Processing 120 (2020) 105278 10.1016/j.mssp.2020.105278
Okamato K, Yamamoto Y, Tanaka H, Tanaka M and Itaya A The Chemical Society of Japan 58 (1985) 2015-22
Carvalho H W, Batista A P, Hammer P and Ramalho T C Journal of hazardous materials 184 (2010) 273-80 10.1016/j.jhazmat.2010.08.033
Sang N X, Quan N M, Tho N H, Tuan N T and Tung T T Semiconductor Science and Technology 34 (2019) 10.1088/1361-6641/aaf820
Rupa A V, Manikandan D, Divakar D and Sivakumar T Journal of hazardous materials 147 (2007) 906-13 10.1016/j.jhazmat.2007.01.107
Xu J, Ao Y, Fu D and Yuan C Applied Surface Science 254 (2008) 3033-8 10.1016/j.apsusc.2007.10.065
Wu L, Yan H, Xiao J, Li X, Wang X and Zhao T Ceramics International 43 (2017) 14334-9 10.1016/j.ceramint.2017.07.189
Sang N X, Sang L P, Quan N M and Tho N H VNU Journal of Science: Mathematics - Physics 34 (2018) 10.25073/2588-1124/vnumap.4273
López R and Gómez R Journal of Sol-Gel Science and Technology 61 (2011) 1-7 10.1007/s10971-011-2582-9
Priyadharsan A, Shanavas S, Vidya C, Kalyana Sundar J, Acevedo R and Anbarasan P M Materials Today: Proceedings (2019) 10.1016/j.matpr.2019.05.440
Kang W, Jimeng X and Xitao W Applied Surface Science 360 (2016) 270-5 10.1016/j.apsusc.2015.10.190
Phan T D, Vo C M, Tran T M T, Luu T L A and Nguyen X S Materials Research Express 6 (2019) 105054 10.1088/2053-1591/ab3a0b
Downloads
Published
How to Cite
Issue
Section
License
This work is licensed under a Creative Commons Attribution-ShareAlike 4.0 International License.
Vietnam Journal of Sciences and Technology (VJST) is an open access and peer-reviewed journal. All academic publications could be made free to read and downloaded for everyone. In addition, articles are published under term of the Creative Commons Attribution-ShareAlike 4.0 International (CC BY-SA) Licence which permits use, distribution and reproduction in any medium, provided the original work is properly cited & ShareAlike terms followed.
Copyright on any research article published in VJST is retained by the respective author(s), without restrictions. Authors grant VAST Journals System a license to publish the article and identify itself as the original publisher. Upon author(s) by giving permission to VJST either via VJST journal portal or other channel to publish their research work in VJST agrees to all the terms and conditions of https://creativecommons.org/licenses/by-sa/4.0/ License and terms & condition set by VJST.
Authors have the responsibility of to secure all necessary copyright permissions for the use of 3rd-party materials in their manuscript.