STUDY ON THE UV-CROSSLINKING PROCESS OF THE DIANE-EPOXY RESIN/POLY(TETRAHYDROFURANE) DIVINYL ETHER SYSTEM II. INFLUENCE OF THE CONTENT OF EPOXY RESIN AND POLY(TETRAHYDROFURANE) DIVINYL ETHER ON THE PHOTOCROSSLINKING OF THE DIANE EPOXY/POLY (TETRAHYDROFURA

Authors

  • Dao Phi Hung Viện Kỹ thuật nhiệt đới, Viện Hàn lâm Khoa học và Công nghệ Việt Nam
  • Nguyen Anh Hiep
  • Mac Van Phuc

DOI:

https://doi.org/10.15625/0866-708X/54/2/6498

Keywords:

Diane-epoxy resin, poly(tetrahydrofurane) divinyl ether, photocrosslinking

Abstract

The effect of diane-epoxy resin (DE) and poly(tetrahydrofuran) divinyl ether (DVE) content on the photo crosslinking reaction of the DE/DVE system with triarylsulfonium salt (TAS) as photo-initiator were investigated. The results showed that increasing DVE content improved some of physico-mechanical properties of photocrosslinked coatings although the relative hardness and the speed of photocrosslinking reaction reduced. The results of the changes of functional groups, relative hardness and gel fraction as well as the physico-mechanical properties of UV-cured coatings based on DE/DVE/TAS system illustrated that suitable mass ratio of constituents was 80/20/5. The UV-cured coating based on the system DE/DVE/TAS = 80/20/5 cross-linked completely after 3.6 seconds UV-exposure and having good physico-mechanical properties: impact resistance reached 180 kg.cm; the flexibility obtained 1mm; the adhesion and relative hardness were point 1 and 0.7, respectively.

Downloads

Download data is not yet available.

Author Biography

Dao Phi Hung, Viện Kỹ thuật nhiệt đới, Viện Hàn lâm Khoa học và Công nghệ Việt Nam

Phòng Vật liệu cao su và dầu nhựa thiên nhiên

Downloads

Published

12-04-2016

Issue

Section

Articles