Lithographic fabrication and spectroscopic characterization of a THz metamaterial absorber
Keywords:perfect absorbers, metamaterials, infrared spectroscopy
THz metamaterial absorbers are often studied by computational techniques, where the influence of actual material parameters and fabricating limitation has not been completely understood. Here we present an experimental investigation on a far-infrared metamaterial absorber composed of a gold disk-shaped resonator, a silicon oxide spacer, and a gold film. The samples are fabricated using the UV laser lithography technique in combination with the electron-beam evaporation. The absorption feature of fabricated samples is examined by Fourier-transformed infrared spectroscopy and supported by finite integration simulations.
V. G. Veselago, Sov. Phys. Usp. 10, 509 (1968). DOI: https://doi.org/10.1070/PU1968v010n04ABEH003699
J. B. Pendry, Phys. World 13, 27 (2000). DOI: https://doi.org/10.1088/2058-7058/13/6/24
N. I. Landy, S. Sajuyigbe, J. J. Mock, D. R. Smith, and W. J. Padilla, Phys. Rev. Lett. 100, 207402 (2008). DOI: https://doi.org/10.1103/PhysRevLett.100.207402
H. Tao, C. M. Bingham, A. C. Strikwerda, D. Pilon, D. Shrekenhamer, N. I. Landy, K. Fan, X. Zhang, W. J. Padilla, and R. D. Averitt, Phys. Rev. B 78, 241103 (2008). DOI: https://doi.org/10.1103/PhysRevB.78.241103
Y. Zhang, Y. Feng, B. Zhu, J. Zhao, and T. Jiang, Opt. Express 22, 22743 (2014). DOI: https://doi.org/10.1364/OE.22.022743
C. M. Watts, X. Liu, and W. J. Padilla, Adv. Mat. 24, OP98 (2012). DOI: https://doi.org/10.1002/adma.201200674
D. T. Viet, N . T. Hien, P. V. Tuong, N. Q. Minh, P. T. Trang, L. N. Le, Y. P. Lee, and V. D. Lam, Opt. Comm. 322, 209 (2014). DOI: https://doi.org/10.1016/j.optcom.2014.02.037
A. Ishikawa and T. Tanaka, Sci. Rep. 5, 12570 (2015). DOI: https://doi.org/10.1038/srep12570
C. Y. Tsai, S. P. Lu, J. W. Lin, and P. T. Lee, Appl. Phys. Lett. 98, 153108 (2011). DOI: https://doi.org/10.1063/1.3579536
C. W. Cheng, M. N. Abbas, C. W. Chiu, K. T. Lai, M. H. Shih, and Y. C. Chang, Opt. Express 20, 10376 (2012). DOI: https://doi.org/10.1364/OE.20.010376
S. Guddala, R. Kumar, and S. A. Ramakrishna, Appl. Phys. Lett. 106, 111901 (2015). DOI: https://doi.org/10.1063/1.4914451
A. D. Khan, M. Amin, A. Ali, S. D. Khan, and R. U. Khan, Appl. Phys. A 120, 641 (2015). DOI: https://doi.org/10.1007/s00339-015-9232-y
Q. Wang, W. Han, P. Liu, and L. Dong, J. Lightwave Tech. 34, 2175 (2016). DOI: https://doi.org/10.1109/JLT.2016.2526634
P. Jahangiri, F. B. Zarrabi, M. N. Moghadasi, A. S. Arezoomand, and S. Heydari, Opt. Comm. 394, 80 (2017). DOI: https://doi.org/10.1016/j.optcom.2017.03.016
C. Z. Tan, J. Non-Crys. Solids 223, 158 (1998). DOI: https://doi.org/10.1016/S0022-3093(97)00438-9
X. K. Bui, S. T. Bui, N. T. Tung, N. T. Hien, Y. J. Kim, L. Y. Chen, Y. P. Lee, T. L. Pham, V. D. Lam, J. Phys. D: Appl. Phys. 53, 105502 (2020). DOI: https://doi.org/10.1088/1361-6463/ab605c
U. T. D. Thuy, N. T. Thuy, N. T. Tung, E. Janssens, and N. Q. Liem, APL Materials 7, 071102 (2019). DOI: https://doi.org/10.1063/1.5102106
J. Zhou, E. N. Economon, T. Koschny, and C. M. Soukoulis, Opt. Lett. 31, 3620 (2006). DOI: https://doi.org/10.1364/OL.31.003620
How to Cite
This work is licensed under a Creative Commons Attribution-ShareAlike 4.0 International License.
Vietnam Journal of Sciences and Technology (VJST) is an open access and peer-reviewed journal. All academic publications could be made free to read and downloaded for everyone. In addition, articles are published under term of the Creative Commons Attribution-ShareAlike 4.0 International (CC BY-SA) Licence which permits use, distribution and reproduction in any medium, provided the original work is properly cited & ShareAlike terms followed.
Copyright on any research article published in VJST is retained by the respective author(s), without restrictions. Authors grant VAST Journals System a license to publish the article and identify itself as the original publisher. Upon author(s) by giving permission to VJST either via VJST journal portal or other channel to publish their research work in VJST agrees to all the terms and conditions of https://creativecommons.org/licenses/by-sa/4.0/ License and terms & condition set by VJST.
Authors have the responsibility of to secure all necessary copyright permissions for the use of 3rd-party materials in their manuscript.