Lithographic fabrication and spectroscopic characterization of a THz metamaterial absorber

Nguyen Thanh Tung; Le Hong Phuc

doi:10.15625/2525-2518/59/1/15415

Lithographic fabrication and spectroscopic characterization of a THz metamaterial absorber

Nguyen Thanh Tung, Le Hong Phuc

Author affiliations

Authors

Nguyen Thanh Tung School of Chemical Engineering, Hanoi University of Science and Technology, No 1, Dai Co Viet, Hai Ba Trung, Ha Noi, Viet Nam
Le Hong Phuc Institute of Materials Science, Vietnam Academy of Science and Technology (VAST),18 Hoang Quoc Viet, Ha Noi, Viet Nam

DOI:

https://doi.org/10.15625/2525-2518/59/1/15415

Keywords:

perfect absorbers, metamaterials, infrared spectroscopy

Abstract

THz metamaterial absorbers are often studied by computational techniques, where the influence of actual material parameters and fabricating limitation has not been completely understood. Here we present an experimental investigation on a far-infrared metamaterial absorber composed of a gold disk-shaped resonator, a silicon oxide spacer, and a gold film. The samples are fabricated using the UV laser lithography technique in combination with the electron-beam evaporation. The absorption feature of fabricated samples is examined by Fourier-transformed infrared spectroscopy and supported by finite integration simulations.

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References

V. G. Veselago, Sov. Phys. Usp. 10, 509 (1968). DOI: https://doi.org/10.1070/PU1968v010n04ABEH003699

J. B. Pendry, Phys. World 13, 27 (2000). DOI: https://doi.org/10.1088/2058-7058/13/6/24

N. I. Landy, S. Sajuyigbe, J. J. Mock, D. R. Smith, and W. J. Padilla, Phys. Rev. Lett. 100, 207402 (2008). DOI: https://doi.org/10.1103/PhysRevLett.100.207402

H. Tao, C. M. Bingham, A. C. Strikwerda, D. Pilon, D. Shrekenhamer, N. I. Landy, K. Fan, X. Zhang, W. J. Padilla, and R. D. Averitt, Phys. Rev. B 78, 241103 (2008). DOI: https://doi.org/10.1103/PhysRevB.78.241103

Y. Zhang, Y. Feng, B. Zhu, J. Zhao, and T. Jiang, Opt. Express 22, 22743 (2014). DOI: https://doi.org/10.1364/OE.22.022743

C. M. Watts, X. Liu, and W. J. Padilla, Adv. Mat. 24, OP98 (2012). DOI: https://doi.org/10.1002/adma.201200674

D. T. Viet, N . T. Hien, P. V. Tuong, N. Q. Minh, P. T. Trang, L. N. Le, Y. P. Lee, and V. D. Lam, Opt. Comm. 322, 209 (2014). DOI: https://doi.org/10.1016/j.optcom.2014.02.037

A. Ishikawa and T. Tanaka, Sci. Rep. 5, 12570 (2015). DOI: https://doi.org/10.1038/srep12570

C. Y. Tsai, S. P. Lu, J. W. Lin, and P. T. Lee, Appl. Phys. Lett. 98, 153108 (2011). DOI: https://doi.org/10.1063/1.3579536

C. W. Cheng, M. N. Abbas, C. W. Chiu, K. T. Lai, M. H. Shih, and Y. C. Chang, Opt. Express 20, 10376 (2012). DOI: https://doi.org/10.1364/OE.20.010376

S. Guddala, R. Kumar, and S. A. Ramakrishna, Appl. Phys. Lett. 106, 111901 (2015). DOI: https://doi.org/10.1063/1.4914451

A. D. Khan, M. Amin, A. Ali, S. D. Khan, and R. U. Khan, Appl. Phys. A 120, 641 (2015). DOI: https://doi.org/10.1007/s00339-015-9232-y

Q. Wang, W. Han, P. Liu, and L. Dong, J. Lightwave Tech. 34, 2175 (2016). DOI: https://doi.org/10.1109/JLT.2016.2526634

P. Jahangiri, F. B. Zarrabi, M. N. Moghadasi, A. S. Arezoomand, and S. Heydari, Opt. Comm. 394, 80 (2017). DOI: https://doi.org/10.1016/j.optcom.2017.03.016

www.cst.com

C. Z. Tan, J. Non-Crys. Solids 223, 158 (1998). DOI: https://doi.org/10.1016/S0022-3093(97)00438-9

X. K. Bui, S. T. Bui, N. T. Tung, N. T. Hien, Y. J. Kim, L. Y. Chen, Y. P. Lee, T. L. Pham, V. D. Lam, J. Phys. D: Appl. Phys. 53, 105502 (2020). DOI: https://doi.org/10.1088/1361-6463/ab605c

U. T. D. Thuy, N. T. Thuy, N. T. Tung, E. Janssens, and N. Q. Liem, APL Materials 7, 071102 (2019). DOI: https://doi.org/10.1063/1.5102106

J. Zhou, E. N. Economon, T. Koschny, and C. M. Soukoulis, Opt. Lett. 31, 3620 (2006). DOI: https://doi.org/10.1364/OL.31.003620

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Published

15-01-2021

How to Cite

[1]

N. T. Tung and L. H. Phuc, “Lithographic fabrication and spectroscopic characterization of a THz metamaterial absorber”, Vietnam J. Sci. Technol., vol. 59, no. 1, pp. 40–46, Jan. 2021.

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Vol. 59 No. 1 (2021)

Section

Materials

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