Photoconductive UV Detectors Based on ZnO Films Prepared by R.F. Magnetron Sputtering Method
Keywords:R.F. magnetron sputtering, ZnO thin film, Photoconductive UV detector, Ohmic contact, Photo-responsivity.
AbstractHighly c-axis oriented zinc oxide (ZnO) thin films were deposited on glass substrates by radio frequency (r.f.) sputtering. The photoconductor UV detector based on ZnO films, having a metal-semiconductor-metal (MSM) structure with interdigitation configuration, were fabricated by using aluminium (Al) as a contact metal. The characteristics of dark and photocurrent of the ultraviolet (UV) detector and the UV photo-response of the detector were investigated. The linear current-voltage (I-V) characteristics under both forward and reverse bias exhibit ohmic metal-semiconductor contacts. Under illumination by monochromatic light at a wavelength of 365~nm, the photo-generated current was measured to be 0.56 $\mu$A at a bias of 6 V. The photo-response decay in these devices is slow.
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How to Cite
Tuyen, N. V., Canh, T. D., & Long, N. N. (2012). Photoconductive UV Detectors Based on ZnO Films Prepared by R.F. Magnetron Sputtering Method. Communications in Physics, 20(1), 77. https://doi.org/10.15625/0868-3166/20/1/2008
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