Vol. 22 No. 1 (2012)

Pulsed Electron Deposition (PED) - a Novel Tool for Growth of Thin Films

Published 07-05-2012

How to Cite

Sang, N. D., Quang, P. H., & Ngoc, D. Q. (2012). Pulsed Electron Deposition (PED) - a Novel Tool for Growth of Thin Films. Communications in Physics, 22(1), 65–73. https://doi.org/10.15625/0868-3166/22/1/634


Pulsed Electron Deposition (PED) is a novel technique that can be applied for growing high quality thin films. In this technique, we used an electron beam with a focused diameter of about 1 mm, the energy up to 15 kV, the frequency of 1-10 Hz, the pulse width of 100 ns and the total current of 1.5 kA generated in a discharge system. A remarkable advantage of this technique is the low deviation in composition from bulk to film. By using the PED technique the transparent coducting ZnO and Cu(InGa)Se\(_{2 }\) films were prepared. The effect of some deposition conditions on the properties of film has been examined and discussed. For Cu(InGa)Se\(_{2 }\), the best film was obtained at the discharge voltage of 12 kV and substrate temperature of 400\(^\circ\)C, while for ZnO, the best film was grown at the oxygen pressure of 1.3 Pa and at 400(^\circ\)C.


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