Pulsed Electron Deposition (PED) - a Novel Tool for Growth of Thin Films

Ngo Dinh Sang, Pham Hong Quang, Do Quang Ngoc
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Authors

  • Ngo Dinh Sang
  • Pham Hong Quang
  • Do Quang Ngoc

DOI:

https://doi.org/10.15625/0868-3166/22/1/634

Abstract

Pulsed Electron Deposition (PED) is a novel technique that can be applied for growing high quality thin films. In this technique, we used an electron beam with a focused diameter of about 1 mm, the energy up to 15 kV, the frequency of 1-10 Hz, the pulse width of 100 ns and the total current of 1.5 kA generated in a discharge system. A remarkable advantage of this technique is the low deviation in composition from bulk to film. By using the PED technique the transparent coducting ZnO and Cu(InGa)Se\(_{2 }\) films were prepared. The effect of some deposition conditions on the properties of film has been examined and discussed. For Cu(InGa)Se\(_{2 }\), the best film was obtained at the discharge voltage of 12 kV and substrate temperature of 400\(^\circ\)C, while for ZnO, the best film was grown at the oxygen pressure of 1.3 Pa and at 400(^\circ\)C.

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Published

07-05-2012

How to Cite

[1]
N. D. Sang, P. H. Quang, and D. Q. Ngoc, “Pulsed Electron Deposition (PED) - a Novel Tool for Growth of Thin Films”, Comm. Phys., vol. 22, no. 1, pp. 65–73, May 2012.

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Papers
Published 07-05-2012