Possibility of Generation and Amplification to High Power of Ultraviolet Ce:LiCAF Laser Short Pulses

Pham Hong Minh, Pham Van Duong, Pham Huy Thong, Do Quoc Khanh, Nguyen Dai Hung, Nobuhiko Sarukura
Author affiliations

Authors

  • Pham Hong Minh Institute of Physics, Vietnam Academy of Science and Technology
  • Pham Van Duong Institute of Physics, Vietnam Academy of Science and Technology
  • Pham Huy Thong Institute of Physics, Vietnam Academy of Science and Technology
  • Do Quoc Khanh Institute of Physics, Vietnam Academy of Science and Technology
  • Nguyen Dai Hung Institute of Physics, Vietnam Academy of Science and Technology
  • Nobuhiko Sarukura Institute of Laser Engineering, Osaka University, Suita Osaka 565-0871, Japan

DOI:

https://doi.org/10.15625/0868-3166/24/3S2/5054

Keywords:

Ce, LiCAF crystal, ultraviolet, short pulse, laser generation, amplification

Abstract

We review the recent progresses in generation and amplification of
ultraviolet laser emissions using Ce$^{3 + }$:LiCaAlF$_{6}$ (Ce:LiCAF)
material as a gain medium. Basing on comparative studies, we have
investigated improvements and proposed possibilities to generate and amplify
ultraviolet short-pulse Ce:LiCAF laser emission to high peak power of
terawatt.

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Published

14-04-2016

How to Cite

[1]
P. H. Minh, P. V. Duong, P. H. Thong, D. Q. Khanh, N. D. Hung and N. Sarukura, Possibility of Generation and Amplification to High Power of Ultraviolet Ce:LiCAF Laser Short Pulses, Comm. Phys. 24 (2016) 91–102. DOI: https://doi.org/10.15625/0868-3166/24/3S2/5054.

Issue

Section

Papers
Received 06-10-2014
Accepted 06-10-2014
Published 14-04-2016

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