Possibility of Generation and Amplification to High Power of Ultraviolet Ce:LiCAF Laser Short Pulses

Pham Hong Minh; Pham Van Duong; Pham Huy Thong; Do Quoc Khanh; Nguyen Dai Hung; Nobuhiko Sarukura

doi:10.15625/0868-3166/24/3S2/5054

Possibility of Generation and Amplification to High Power of Ultraviolet Ce:LiCAF Laser Short Pulses

Pham Hong Minh, Pham Van Duong, Pham Huy Thong, Do Quoc Khanh, Nguyen Dai Hung, Nobuhiko Sarukura

Author affiliations

Authors

Pham Hong Minh Institute of Physics, Vietnam Academy of Science and Technology
Pham Van Duong Institute of Physics, Vietnam Academy of Science and Technology
Pham Huy Thong Institute of Physics, Vietnam Academy of Science and Technology
Do Quoc Khanh Institute of Physics, Vietnam Academy of Science and Technology
Nguyen Dai Hung Institute of Physics, Vietnam Academy of Science and Technology
Nobuhiko Sarukura Institute of Laser Engineering, Osaka University, Suita Osaka 565-0871, Japan

DOI:

https://doi.org/10.15625/0868-3166/24/3S2/5054

Keywords:

Ce, LiCAF crystal, ultraviolet, short pulse, laser generation, amplification

Abstract

We review the recent progresses in generation and amplification of
ultraviolet laser emissions using Ce$^{3 + }$:LiCaAlF$_{6}$ (Ce:LiCAF)
material as a gain medium. Basing on comparative studies, we have
investigated improvements and proposed possibilities to generate and amplify
ultraviolet short-pulse Ce:LiCAF laser emission to high peak power of
terawatt.

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Published

14-04-2016

How to Cite

[1]

P. H. Minh, P. V. Duong, P. H. Thong, D. Q. Khanh, N. D. Hung, and N. Sarukura, “Possibility of Generation and Amplification to High Power of Ultraviolet Ce:LiCAF Laser Short Pulses”, Comm. Phys., vol. 24, no. 3S2, pp. 91–102, Apr. 2016.

IEEE

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Issue

Vol. 24 No. 3S2 (2014)

Section

Papers

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