Characterization of ZnO:Al deposited by co-sputtering for transparent conductive electrodes

Nguyen Tran Thuat; Bui Bao Thoa; Than Thi Cuc; Nguyen Minh Hieu; Hoang Ngoc Lam Huong; Bui Van Diep; Hoang Chi Hieu

doi:10.15625/0868-3166/25/4/7478

Characterization of ZnO:Al deposited by co-sputtering for transparent conductive electrodes

Nguyen Tran Thuat, Bui Bao Thoa, Than Thi Cuc, Nguyen Minh Hieu, Hoang Ngoc Lam Huong, Bui Van Diep, Hoang Chi Hieu

Author affiliations

Authors

Nguyen Tran Thuat Nano and Energy Center, VNU University of Science, 334 Nguyen Trai, Thanh Xuan District, Hanoi, Vietnam
Bui Bao Thoa Nano and Energy Center, VNU University of Science, 334 Nguyen Trai, Thanh Xuan District, Hanoi, Vietnam
Than Thi Cuc Nano and Energy Center, VNU University of Science, 334 Nguyen Trai, Thanh Xuan District, Hanoi, Vietnam
Nguyen Minh Hieu Nano and Energy Center, VNU University of Science, 334 Nguyen Trai, Thanh Xuan District, Hanoi, Vietnam
Hoang Ngoc Lam Huong Nano and Energy Center, VNU University of Science, 334 Nguyen Trai, Thanh Xuan District, Hanoi, Vietnam
Bui Van Diep Nano and Energy Center, VNU University of Science, 334 Nguyen Trai, Thanh Xuan District, Hanoi, Vietnam
Hoang Chi Hieu Faculty of Physics, VNU University of Science, 334 Nguyen Trai, Thanh Xuan District, Hanoi, Vietnam

DOI:

https://doi.org/10.15625/0868-3166/25/4/7478

Keywords:

AZO thin film, co-sputtering method, resistivity, transmittance

Abstract

Aluminum doped zinc oxide was prepared by magnetron sputtering methods at room temperature using a ZnO ceramic target doped 2%wt by Al₂O₃. The optical transmittance of the films is higher than 80% in the visible range. A direct bandgap type was reached by controlling deposition conditions; the bandgap value was in the range between 3.2 eV and 4.2 eV. Good electrical and optical properties were obtained for the films deposited by an appropriate co-sputtering of ZnO and Al targets. These films with a resistivity, about 1.3´10^-2W.cm, and a transmittance, higher than 80%, can be applicable for transparent conducting electrodes.

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Published

31-12-2015

How to Cite

[1]

N. T. Thuat, B. B. Thoa, T. T. Cuc, N. M. Hieu, H. N. L. Huong, B. V. Diep and H. C. Hieu, Characterization of ZnO:Al deposited by co-sputtering for transparent conductive electrodes, Comm. Phys. 25 (2015) 341. DOI: https://doi.org/10.15625/0868-3166/25/4/7478.

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Vol. 25 No. 4 (2015)

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