Possibility of Generation and Amplification to High Power of Ultraviolet Ce:LiCAF Laser Short Pulses

Pham Hong Minh, Pham Van Duong, Pham Huy Thong, Do Quoc Khanh, Nguyen Dai Hung, Nobuhiko Sarukura

Abstract


We review the recent progresses in generation and amplification of
ultraviolet laser emissions using Ce$^{3 + }$:LiCaAlF$_{6}$ (Ce:LiCAF)
material as a gain medium. Basing on comparative studies, we have
investigated improvements and proposed possibilities to generate and amplify
ultraviolet short-pulse Ce:LiCAF laser emission to high peak power of
terawatt.

Keywords


Ce:LiCAF crystal, ultraviolet, short pulse, laser generation, amplification

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DOI: https://doi.org/10.15625/0868-3166/24/3S2/5054 Display counter: Abstract : 61 views. PDF : 34 views.

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